AI-Powered GaN Epitaxy Solution

IVWorks’ distinctive technology leads the innovation of next-generation semiconductor materials.

Enabling 5G&6G mobile communications
through broadband
and high frequency radio technology

RF POWER DEVICE

Empowering next-generation satellite communication with
superior reliability & high-power characteristics

RF POWER DEVICE

Advanced radar technology implementation
through Increased transmission and reception strength

RF POWER DEVICE

Enhanced EV
efficiency
via improved
power distribution and
and module miniaturization

DC POWER DEVICE

High-temperature stability
and increased
power density

DC POWER DEVICE

High-speed wireless charging
and power transmission applications in diverse fields

DC POWER DEVICE

IVWorks provides next-generation compound semiconductor materials.

Cutting-edge WBG epitaxial wafer products and epitaxy related services

Artificial Intelligent Epitaxy Platform

The world’s first and only AI-powered
Epiwafer production facility

IVWorks leads the market in the era of GaN epiwafers and maintains its technological advantages in the area of
semiconductor materials with its core technology-integrated high-quality GaN epiwafers and customized material solutions.

  • Eco-Friendly Manufacturing

    High-efficiency, low-carbon epitaxial processes

    We strive to preserve a clean environment and welfare of humanity and cultivate an evolution of eco-friendly technology for the future by implementing high-efficiency, eco-friendly, and low-carbon processes by developing our own equipment.

  • Global Networks

    Global network
    expansion

    IVWorks is the only Korean company that can produce GaN epiwafers and is growing to become a global GaN epiwafer specialist.
    IVWorks has expanded its global network through partnerships with the world’s leading semiconductor manufacturers to maintain its top-tier position in the compound semiconductor area.

Check out
IVWorks’ technology

Epitaxial Growth

SADA
Innovative defect density reduction
Crack-Free
Crack-causing element elimination and bending control
Artificial Intelligence Platform
Real-time production process monitoring and condition control

Epitaxial Facility

Hybrid-MBE
Thin film growth at a high growth rate of at least 2µmh-1 and a low growth temperature of 800°C to reduce cracking and impurity content

Artificial Intelligence Platform

AI Epitaxy Platform DOMM™
IVWorks presents a deep-learning-based artificial intelligence (AI) epitaxy platform, DOMM™, by combining an AI-based image analysis technique with Hybrid-MBE.

Epitaxial Growth

SADA
Innovative defect density reduction
Crack-Free
Crack-causing element elimination and bending control
Artificial Intelligence Platform
Real-time production process monitoring and condition control

Epitaxial Facility

Hybrid-MBE
Thin film growth at a high growth rate of at least 2µmh-1 and a low growth temperature of 800°C to reduce cracking and impurity content

Artificial Intelligence Platform

AI Epitaxy Platform DOMM™
IVWorks presents a deep-learning-based artificial intelligence (AI) epitaxy platform, DOMM™, by combining an AI-based image analysis technique with Hybrid-MBE.

Latest News from IVWorks